E-Beam Lithography, Part 2

E-beam lithography is the process of directing an electron beam across a resist layer and thereby creating a pattern that can be etched. Structures of 20nm can be produced. This is the technique that is often used to create nano scale waveguides and microring resonators. One type uses an scanning electron microscope equipped with special beam control software. The other far more expensive method is a dedicated e-beam facility that is able to etch structures directly.
This video is part 2 of a 3-part series.
More information on CMDITR's wiki:
depts.washington.edu/cmditr/me...

[@panthrohit]

How long it would take to pattern a 1cmX1cm with the same patterning of the holes of 200nm?

[@Jkauppa]

electron or ion printer burning or painting, with direct pvd voltage etching or embedding

[@mudassarhassan96]

Plz send the vedio of nanoimprint lithography

[@absolute___zero]

doesn't look that complex that an EUV machine from ASML that ships in 40 freight containers , has 100,000 parts and is worth 120 million bucks. I think I can make one at home. This way, my 20nm chip isn't going to cost me half a billion dollars

[@MrFujinko]

Seek medical attention.

[@absolute___zero]

@@MrFujinko medical attention need the employees of ASML, who need 5 km of factories to manufacture a chip of only 4 different material types. That goes even beyond the definition of insanity.

[@absolute___zero]

@@RINGTONE_XE exactly f*ck ASML, I am currently building a nano-scale CNC router with interferometric sensors, will be printing my own transistors soon. Check out nano-electrochemcanical relays, this stuff is now perfectly replacing CMOS with a gate delay of as low as 10 nanoseconds. It is way easier to manufacture, you dont need anydoping, any UV and stuff like in lithography. There is really a revolution going on in computation models, some guys created gates of just gold and vacuum. But nano electromechanical relays are easiest computational devices out there.