Electronic materials, devices, and fabrication by Prof S. Parasuraman,Department of Metallurgy and Material Science,IIT Madras.For more details on NPTEL visit nptel.ac.in
@@enigma3264 For nanoscale features photolithography can still be used. There are multiple "cheats" to beat the diffraction limit some of which are phase shifting masks, immersion optics, and multiple exposure patterning. If you have 193nm light (as is standard) but you need 7nm features (as is current feature size) that is well beyond the diffraction limit however, these techniques can allow very precise expose of light.
Thank you so much! This video helps me tons for my assignment project.
So informative.Thank you Sir.
very nice sir g
Nice lecture
👍👍👍
excelente
Nice sir
thank you
Thank you sir ❤❤❤❤❤❤
Thank you sir
can we beat rayleigh limit in lithography?
Kaleem ur Rahman Khan i think we cant. Thats why we use electron beam litho for sub microns size.
@@enigma3264 For nanoscale features photolithography can still be used. There are multiple "cheats" to beat the diffraction limit some of which are phase shifting masks, immersion optics, and multiple exposure patterning. If you have 193nm light (as is standard) but you need 7nm features (as is current feature size) that is well beyond the diffraction limit however, these techniques can allow very precise expose of light.
Good video, but has a grave mistake. Extreme UV is 13.5 nm and not 135 nm.
This is why India is in such a pathetic situation. things that should be shown practically are being written on the board.. lol
MIT also uses green board for lectures and sometimes slides on projector.