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Leti and Atomera!!
How do you think, when forksheet fet with Full bottom dielectric isolation will come. Impact of self heating effect in bottom dielectric isolation is not overcom
Is it possible to avoid SOI on substrate method by implementating High K metal dielectric as gate
Leti and Atomera!!
How do you think, when forksheet fet with Full bottom dielectric isolation will come. Impact of self heating effect in bottom dielectric isolation is not overcom
Is it possible to avoid SOI on substrate method by implementating High K metal dielectric as gate