Animation of atomic layer deposition of hafnium oxide

Nanometre-thin films can be deposited using Atomic Layer Deposition (ALD). This example shows the ALD chemistry for producing HfO2 from gaseous precursors HfCl4 (Cl=green) and H2O (O=red). ALD allows a uniform coating to be applied to complex objects - such as the inside of the fibre optic cable shown here.

[@trailblazinn]

great animation! very clear and easy to follow for people new to ALD!

[@han-bo-ramlee4563]

Looks very nice, Simon!

[@billcritical]

That is impressive. I am curious how well this works in semiconductor manufacturing. Obviously this has to be done under vacuum. I suppose it isn't enhanced by anything other than perhaps heat?

[@holyriver6]

wonderful!

[@saidgherras9179]

plzz you have a video of "Thin deposit layer on polymer by plasma"

[@JorgeSanchez-mv4yy]

what software you used to make the video?

[@user-dd7wz6tn3e]

nice video